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86-532-68960800
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01 Xiaoxin Industrial Park, Daxin Town, Jimo, Qingdao, Shandong, China
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k@waimaotong.com

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Magnetron sputtering PVD vacuum coating equipment / machine / plant

Magnetron sputtering PVD vacuum coating equipment / machine / plant

Magnetron sputtering PVD vacuum coating equipment / machine / plant,UBU,Machinery & Industrial Parts,Machinery,Metal & Metallurgy Machinery,Metal Electroplating Machinery

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Description

Overview

Quick Details

Condition:: New

Place of Origin:: Shandong, China (Mainland)

Brand Name:: UBU

Voltage:: 380V

Power(W):: 60KW

Dimension(L*W*H):: custom

Weight:: 3 tons

Certification:: CE SGS ISO9001,CE SGS

Warranty:: 12 months

After-sales Service Provided:: Engineers available to service machinery overseas

used machine:: Yes, we have used machine

customized:: Yes, this machine is customized

Supply Ability

Supply Ability:: 3 Set/Sets per Month

Packaging & Delivery

Packaging Details: wooden cases

Port: Qingdao

Commodity Name

Magnetron sputtering PVD vacuum coating equipment / machine / plant

Product Description

Vacuum magnetron sputtering machine is widely used in electrical appliances, clocks, lamps, toys, headlights reflectors, cell phone case , instrumentation, plastic, glass, ceramics, tiles and other surface decorative coating and the functionality of the tool and die coating. The so called "sputtering" is the charge of energetic particles (usually gas positive ions) bombardment of objects, causing the phenomenon of surface atoms escape from the mother. As early as 1842 Grove in the lab discovered this phenomenon. The magnetron sputtering target stationary electromagnetic field, the magnetic field is curved, uniform electric field and the number of electric field for the plane target and coaxial cylindrical target. Electrons under the effective ofelectric field, accelerated toward the substrate, the process of collision with argon atoms. If the electron has enough energy (about 30ev), then the ionization of Ar and produce electrons, the electrons onto the substrate, Ar + under the effective of electric field to accelerate toward the cathode (sputtering target) and high-energy bombardment of the target surface. the target occurred sputtering. Our company magnetron sputtering device has the following major features: 1) film thickness controllability and well repeatability,can be a reliable system of pre-plated thickness of the films and sputtering in a larger surface of uniform film; 2) The adhesion of the film and the substrate is very well. Some of the high energy of sputtered atoms to produce different levels of injection phenomenon, pseudo-diffusion layer formed on the substrate layer of sputtered atoms and substrate atoms fused with each other; 3) Preparation of special material of the film, you can use different materials and sputtering hybrid film, compound film,also can be sputtered into the TiN imitation gold film; 4) layer of high purity sputtering film will not be mixed in the crucible the composition of the heater material.

Vacuum magnetron sputtering machine is widely used in electrical appliances, clocks, lamps, toys, headlights reflectors, cell phone case , instrumentation, plastic, glass, ceramics, tiles and other surface decorative coating and the functionality of the tool and die coating. The so called "sputtering" is the charge of energetic particles (usually gas positive ions) bombardment of objects, causing the phenomenon of surface atoms escape from the mother. As early as 1842 Grove in the lab discovered this phenomenon. The magnetron sputtering target stationary electromagnetic field, the magnetic field is curved, uniform electric field and the number of electric field for the plane target and coaxial cylindrical target. Electrons under the effective ofelectric field, accelerated toward the substrate, the process of collision with argon atoms. If the electron has enough energy (about 30ev), then the ionization of Ar and produce electrons, the electrons onto the substrate, Ar + under the effective of electric field to accelerate toward the cathode (sputtering target) and high-energy bombardment of the target surface. the target

occurred sputtering.

Our company magnetron sputtering device has the following major features:

1) film thickness controllability and well repeatability,can be a reliable system of pre-plated thickness of the films and sputtering in a larger surface of uniform film;

2) The adhesion of the film and the substrate is very well. Some of the high energy of sputtered atoms to produce different levels of injection phenomenon, pseudo-diffusion layer formed on the substrate layer of sputtered atoms and substrate atoms fused with each other;

3) Preparation of special material of the film, you can use different materials and sputtering

hybrid film, compound film,also can be sputtered into the TiN imitation gold film;

4) layer of high purity sputtering film will not be mixed in the crucible the composition of the heater material.

Specification

Model	CK-900	CK-1000	CK-1250	CK-1400	CK-1600
Size of vacuum chamber	Φ 900×H 1100Mm	Φ 1000×H1200mm	Φ 1250×H 1350mm	Φ 1400×H 1600mm	Φ 1600×H 1800mm
Power Supply Type	Pulse Bias Power Supply, Direct Current magnetron power Supply, Medium Frequency Magnetron Power Supply
Structure of Vacuum Chamber	Vertical Single/Double Door, Back Vacuum Acquisition System
Material of Vacuum Chamber	Superior Stainless Steel Chamber
Ultimate Vacuum	8.0×10-4Pa
Pump-out Time	From air to 8.0×10-3Pa≤20min(no-load)
Vacuum Acquisition System	Diffusion pump or molecular pump+Roots pump+Mechanical pump+Holding pump (The specification can be selected according customer’s demand)
Coating Style	magnetron sputtering coating
Kinds of Film	compound film, metal film, multilayer film, semi-conductor film etc
The Style of Magnetron target	Flat magnetron target, cylindrical magnetron target, twin magnetron dual target .
Power rate and target number	Selected according to demanders’requirements and different techniques
Evaporation Power	20KW/set	20KW/set	30KW/set	40KW/set	50KW/set
Rotating Stand and Rotating Style	Planetary autorotation and frequency conversion speed regulation (controlled and adjustable)
Process Gas	Three or four process gas flow control and display system, select automatic filling system
Cooling System	Water-cooling circulatory system,cooling water tower or industrial cooling water machine is also needed. (which are supplied by demander)
Control mode	Manual operation modes + PLC touch screen
Total power	35KW	40KW	50KW	65KW	80KW
Alarm and Protection	Abnormal conditions like water failure or over-current or over-voltage disconnection.It can carries out protective measurements and has the function of interlock.
Cover Area	W2.5m× L3.5m	W3m×L4m	W4m× L5m	W4.5m× L6m	W5m× L7m
Other Technical Parameters	Water pressure≥0.2MPa, water temperature≤25, gas pressure0.5-0.8MPa
Remark	Designed flexible and select the appropriate equipment according to demanders’requirements . (The range of vacuum chamber Φ 0.5-3m,H: 0.5-3m).

Packaging & Shipping

Wooden cases

Our Services

Warranty: 1 year

Installation: Engineers available to service machinery by go to customers' country.

Reception of visitors: Customers can come to our factory to study and operate with free accommodation.

FAQ

Accessories:

Diffusion pump, rotary vane pump, roots pump, holding pump, pulse magnetron sputtering power,unipolar pulse power, frequency magnetron power, DC magnetron power, vacuum gauge, flange.

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Contact information

Michelle Qiu

Tel / Whatsapp: 0086 18906391496

QQ: 2728620437

Skype: Michelle.y Qiu

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Magnetron sputtering PVD vacuum coating equipment / machine / plant