86-532-68960800
01 Xiaoxin Industrial Park, Daxin Town, Jimo, Qingdao, Shandong, China
Vacuum Magnetron Sputtering Coating Machine
Vacuum magnetron sputtering machine is widely used in electrical appliances, clocks, lamps,
toys, headlights reflectors, cell phone case , instrumentation, plastic, glass, ceramics, tiles and
other surface decorative coating and the functionality of the tool and die coating. The so-called
"sputtering" is the charge of energetic particles (usually gas positive ions) bombardment of
objects, causing the phenomenon of surface atoms escape from the mother. As early as 1842
Grove in the lab discovered this phenomenon. The magnetron sputtering target stationary
electromagnetic field, the magnetic field is curved, uniform electric field and the number of
electric field for the plane target and coaxial cylindrical target. Electrons under the effective of
electric field, accelerated toward the substrate, the process of collision with argon atoms. If the
electron has enough energy (about 30ev), then the ionization of Ar + and produce electrons, the
electrons onto the substrate, Ar + under the effective of electric field to accelerate toward the
cathode (sputtering target) and high-energy bombardment of the target surface. the target
occurred sputtering.
Our company magnetron sputtering device has the following major features:
1) film thickness controllability and well repeatability,can be a reliable system of pre-plated
thickness of the films and sputtering in a larger surface of uniform film;
2) The adhesion of the film and the substrate is very well. Some of the high energy of sputtered
atoms to produce different levels of injection phenomenon, pseudo-diffusion layer formed on the
substrate layer of sputtered atoms and substrate atoms fused with each other;
3) Preparation of special material of the film, you can use different materials and sputtering
hybrid film, compound film,also can be sputtered into the TiN imitation gold film;
4) layer of high purity sputtering film will not be mixed in the crucible the composition of the
heater material.
Model | CK-900 | CK-1000 | CK-1250 | CK-1400 | CK-1600 |
Size of vacuum chamber | Φ 900×H 1100Mm | Φ 1000×H1200mm | Φ 1250×H 1350mm | Φ 1400×H 1600mm | Φ 1600×H 1800mm |
Power Supply Type | Pulse Bias Power Supply, Direct Current magnetron power Supply, Medium Frequency Magnetron Power Supply | ||||
Structure of Vacuum Chamber | Vertical Single/Double Door, Back Vacuum Acquisition System | ||||
Material of Vacuum Chamber | Superior Stainless Steel Chamber | ||||
Ultimate Vacuum | 8.0×10-4Pa | ||||
Pump-out Time | From air to 8.0×10-3Pa≤20min(no-load) | ||||
Vacuum Acquisition System | Diffusion pump or molecular pump+Roots pump+Mechanical pump+Holding pump (The specification can be selected according customer’s demand) | ||||
Coating Style | magnetron sputtering coating | ||||
Kinds of Film | compound film, metal film, multilayer film, semi-conductor film etc | ||||
The Style of Magnetron target | Flat magnetron target, cylindrical magnetron target, twin magnetron dual target . | ||||
Power rate and target number | Selected according to demanders’requirements and different techniques | ||||
Evaporation Power | 20KW/set | 20KW/set | 30KW/set | 40KW/set | 50KW/set |
Rotating Stand and Rotating Style | Planetary autorotation and frequency conversion speed regulation (controlled and adjustable) | ||||
Process Gas | Three or four process gas flow control and display system, select automatic filling system | ||||
Cooling System | Water-cooling circulatory system,cooling water tower or industrial cooling water machine is also needed. (which are supplied by demander) | ||||
Control mode | Manual operation modes + PLC touch screen | ||||
Total power | 35KW | 40KW | 50KW | 65KW | 80KW |
Alarm and Protection | Abnormal conditions like water failure or over-current or over-voltage disconnection.It can carries out protective measurements and has the function of interlock. | ||||
Cover Area | W2.5m× L3.5m | W3m×L4m | W4m× L5m | W4.5m× L6m | W5m× L7m |
Other Technical Parameters | Water pressure≥0.2MPa, water temperature≤25, gas pressure0.5-0.8MPa | ||||
Remark | Designed flexible and select the appropriate equipment according to demanders’requirements . (The range of vacuum chamber Φ 0.5-3m,H: 0.5-3m). | ||||
Under customers' requirement.
Warranty: 1 year
Installation: Engineers available to service machinery by go to customers' country.
Reception of visitors: Customers can come to our factory to study and operate with free accommodation.
Accessories:
Diffusion pump, rotary vane pump, roots pump, holding pump, pulse magnetron sputtering power,unipolar pulse power, frequency magnetron power, DC magnetron power, vacuum gauge, flange.
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