1. Type of equipment: horizontal continuous magnetron sputtering coating line 2. Production cycle: 60s 3. Production ability: about 2,000,000 m2 per year 4. Max. size of glass sheet: 9000mm×2540mm 5. Uniformity of the film: in the effective deposition area, the film thickness uniformity ≤ 5% 6. Cathode structure design: adopts medium frequency twin rotary cathode, target specifications depending on the product 7. Transmission mode: adopt the mold of double friction-driving conveying device (no wheel design) 8. Coating process method : adopt ZnO:Al ceramic target and reactive sputtering deposition process 9. Coating temperature control: stainless steel sheathed heating device ( heating lamps can be equipped by requested), the temperature can be set from room temperature to 350℃(±5℃). 10. Control system: configuration software combining with PLC can realize man-machine conversation so as to make the necessary timely intervention on the survival process. There has alarm and fault display during the operation.
Technical Parameter
1. Ultimate vacuum:6× 10-4 Pa
2. Average production cycle: 80~180 sec/frame (According to the product)